"DEPOSITION" software system is designed for calculation of deposition rate and film thickness distribution at magnetron sputtering for varuious configurations of sputtering areas of magnetron sputtering systems and substrate movement systems.
Software Deposition is intended for calculation of deposition rate and film thickness distribution at magnetron sputtering for axial and extended magnetron and various configurations of substrate transportation systems.
Advantages:
- Quick calculation of distribution profiles of deposition rate and film thickness for axial and extended magnetron and various configurations of substrate transportation systems;
- Availability of most of the main magnetron sputtering process configurations used in scientific research and industry;
- Сapability process configuration customization
Our primary activity is scientific research and development in various fields such as electromagnetic compatibility, microwave technologies, microelectronics and nanotechnologies, information protection and speech technologies, telecommunications and etc. For the current moment the institution has more than 300 patents and international partners in more than 70 countries.
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